The Dutch vacuum society (NEVAC) and TNO (Dutch Organization for Applied Scientific Research) are organizing an IUVSTA workshop on ultra-clean vacuum.
Vacuum technology plays an important role in both industry and science. Think of the semiconductor industry, metrology equipment manufacturers and users (XPS, SEM, TEM, TOF-SIMS, …), and large scientific setups like CERN, LIGO, and synchrotrons.
Contamination control, or ultra-clean vacuum, plays a crucial role in driving down resolution in lithography and metrology applications, contaminants can also reduce signal-to-noise ratios in scientific experiments. Contamination is known to affect both samples, sensors, and optics.
An illustrative example from the semiconductor industry is ASML’s EUV wafer stepper, which needs extreme cleanliness inside the highly complex machine. This cleanliness is needed not only to optimize microchip production yield but also to guarantee and increase the lifetime and performance of the wafer stepper.
The term 'ultra-clean vacuum’ specifically refers to those situations where not only the vacuum’s pressure but also the residual gas composition is relevant. Ultra-clean vacuum is and will become even more important in domains like the semiconductor industry, Space, and quantum computing.
Special attention will be directed to ensure knowledge and experience sharing between the various technology domains and between academia and manufacturers. Participants from all fields are invited to participate in this workshop.
This workshop will take place in the historic city of Delft, the Netherlands, from 3-6 February 2025.
All inclusive registration fee for this event: € 600,- (excl. VAT)
NEVAC NEDERLANDSE VACUÜMVERENIGING
Innovation for life | TNO
IUVSTA – International Union for Vacuum Science, Technique and Applications